| Structure: |
vertical box-type structure with front opening (chamber inner size: Φ 2100 mm x 1700 mm); |
| Maximal Baking Temperature: |
350 °C; |
| Normal Working Temperature: |
Room temperature - 300 °C |
| Vacuum System: |
primary pump consists of molecular pump, diffusion pump + backing pump, pneumatic valve, etc... |
| Ultimate Pressure: |
3.0 X 10-4 Pa; |
| Working Pressure: |
attaining 4 x 10-3 Pa in 15 minutes after exposure; |
| Evaporation Source: |
signal-E- beam or dual-E-beam gun; resistance-heated source; |
| Ion Source: |
Hall ion source/ Kaufman ion source optional; |
| Cryochiller: |
12P or 15P optional, -135 °C as minimum temperature; |
| Safety Device: |
electric bonding and limit switch on chamber door; |
| Deposition Controller: |
INFICON SQC-310; |
| Others: |
operation panel of 9-inch GUI, blackout resume, automated control of vacuum/continuous coating system. |
